SCIL Nanoimprint Solutions offers solutions for making nano-structures on wafers by using its unique and proprietary lithography technology (SCIL). These nano-structures are used on optics and other photonic products to increase performance, lower end-product costs and increase functionality.

SCIL or Substrate Conformal Imprint Lithography is a cost effective, robust, high yield process enabling nanometer resolution patterns on a large variety of materials. SCIL delivers proven, high quality imprints on wafer areas up to 300 mm. It can be used to make patterns with feature sizes down to less than 10 nm and overlay alignment below 1 µm.

SCIL Nanoimprint Solutions helps customers with optimized equipment, consumable materials and processes for high volume production.

Optimal performance

Our scalable process reduces your risks from concept to volume manufacture by using compatible processes and materials. Essentially, optimal equipment design ensures optimal output with optimal cost performance. So, you can jump-start your products in the market and guarantee that your solutions will be of the highest quality.

We provide you with:

• Tooling and processes for small series and high volume production
• Consumables (stamp and imprint materials)
• Dedicated processes for your requirement